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1 ion etching
іонне [іонно-променеве] травленняEnglish-Ukrainian dictionary of microelectronics > ion etching
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2 ion etching
фіз. -
3 ion etching
фіз. -
4 ion etching station
устаткування іонного травленняEnglish-Ukrainian dictionary of microelectronics > ion etching station
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5 deep reactive ion etching (DRIE)
глибинне реактивне іонне травленняEnglish-Ukrainian dictionary of microelectronics > deep reactive ion etching (DRIE)
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6 deep reactive ion etching (DRIE)
глибинне реактивне іонне травленняEnglish-Ukrainian dictionary of microelectronics > deep reactive ion etching (DRIE)
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7 diode (ion) etching
іонне травлення в двохелектродній системіEnglish-Ukrainian dictionary of microelectronics > diode (ion) etching
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8 diode (ion) etching
іонне травлення в двохелектродній системіEnglish-Ukrainian dictionary of microelectronics > diode (ion) etching
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9 high-frequency ion etching
високочастотне іонне травленняEnglish-Ukrainian dictionary of microelectronics > high-frequency ion etching
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10 hydrogen reactive ion etching
реактивне іонне травлення в середовищі воднюEnglish-Ukrainian dictionary of microelectronics > hydrogen reactive ion etching
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11 reactive ion etching
реактивне іонне травлення, РІТEnglish-Ukrainian dictionary of microelectronics > reactive ion etching
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12 tetrode (ion) etching
іонне травлення в чотириелектродній системіEnglish-Ukrainian dictionary of microelectronics > tetrode (ion) etching
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13 tetrode (ion) etching
іонне травлення в чотириелектродній системіEnglish-Ukrainian dictionary of microelectronics > tetrode (ion) etching
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14 triode (ion) etching
іонне травлення в трьохелектродній системіEnglish-Ukrainian dictionary of microelectronics > triode (ion) etching
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15 triode (ion) etching
іонне травлення в трьохелектродній системіEnglish-Ukrainian dictionary of microelectronics > triode (ion) etching
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16 etching
травлення (див. т-ж etch) - anisotropic etching
- anode etching
- batch etching
- blanket etching
- chemically assisted etching
- concentration dependent etching
- crystallographically sensitive etching
- deep reactive ion etching DRIE
- deep reactive ion etching
- differential etching
- digital etching
- diode ion etching
- diode etching
- dip etching
- directional etching
- dislocation etching
- dry process etching
- dry etching
- electron-beam induced etching
- excessive etching
- exciraer laser etching
- gas-phase plasma-assisted etching
- high-frequency ion etching
- hydrogen reactive ion etching
- ion etching
- ion-assisted plasma etching
- ion-beam induced etching
- isotropic etching
- jet etching
- laser-enhanced etching
- laser-induced pattern projection etching
- laser radical etching
- lateral etching
- lift-off etching
- light-induced etching
- low-pressure plasma etching
- low-pressure etching
- masked etching
- maskless etching
- maskless laser etching
- mesa etching
- microwave plasma etching
- microwave etching
- mild etching
- nonundercutting etching
- orientation-dependent etching
- oxygen gas plasma etching
- permeation etching
- photochemical etching
- photoelectrochemical etching
- photo-enhanced chemical dry etching
- photoexcited etching
- photo-initiated etching
- photoresist-masked etching
- plasma reactor etching
- plasma etching
- post etching
- preferential etching
- radical plasma etching
- radical etching
- radio-frequency plasma etching
- reactive ion etching
- regenerative etching
- resistless etching
- selective etching
- sharp etching
- sideways etching
- single-step laser etching
- spray etching
- sputter etching
- steady-state etching
- synchrotron radiation-assisted etching
- taper etching
- tetrode ion etching
- tetrode etching
- triode ion etching
- triode etching
- undercuttingetching
- undercutetching
- UV laser etching
- vacuum ultraviolet-assisted etching
- vertical etching
- VUV-assisted etching
- wet chemical etching
- wet etching
- zero-undercut etching -
17 ion-assisted plasma etching
травлення в плазмі, що супроводжуєтсья іонним бомбардуванням (1–100 мТор)English-Ukrainian dictionary of microelectronics > ion-assisted plasma etching
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18 ion-beam induced etching
травлення під дією іонного пучка, іонно-стимульоване (пучкове) травленняEnglish-Ukrainian dictionary of microelectronics > ion-beam induced etching
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19 station
1) (робоча) позиція; робоче місце 2) пристрій; устаткування - assembly station
- CAD work station
- CAD station
- cassette-to-cassette end station
- clean work station
- color work station
- graphic station
- interactive display station
- ion etching station
- laminar-flow station
- modular station
- pickup station
- prefunctional test station
- probe station
- soldering station
- test station
- wafer handling station
- wafer inspection station
- WIP station
- work station
- workpiece-in-process station -
20 system
1) система 2) устаткування; пристрій - assembly system
- autolayout system
- automated accounting system
- automated photomasking system
- automated photomask system
- automatic data асquisition system
- automatic data analysis system
- automatic data digitizing system
- base-metal system
- batch system
- bi-etching system
- bubble test system
- building-block layout system
- CAD system
- cassette-to-cassette system
- chopping system
- closed-tube oxidation-diffusion system
- code-translation data system
- command retrieval system
- computer-aided design system
- conductor paste system
- conductor system
- continuous stage motion e-beam system
- Czochralski production system
- damage tolerant system
- data асquisition and display system
- data analysis and reduction system
- data collection and processing system
- decision data support system
- decision-support system
- deep-UV projection system
- design automation system
- die attach system
- dielectric paste system
- dielectric system
- diffusion system
- direct step-on-wafer system
- direct-write e-beam system
- dopant system
- double-chamber vacuum-deposition system
- double-track system
- electron-beam mask system
- electron-beam projection system
- encapsulation welding system
- epitaxial growth system
- epitaxial system
- epoxy dispensing system
- etchant regeneration system
- etching system
- etch/strip system
- evaporation system
- exposure system
- fabrication system
- fault-tolerant system
- flex-fab system
- flexible machining system
- fly’s eye system
- gate-array layout system
- Gaussian-beam e-beam system
- Genesil system
- graphite furnace atomic absorption system
- hierarchically CAD system
- hierarchical-oriented CAD system
- high-resolution electron-beam system
- IC system
- image projection system
- indexing system
- ink system
- in-line system
- integrated programmable gate-array system
- ion-beam system
- ion-beam sputtering system
- isoplanar system
- laminar-flow system
- lead-forming system
- lead-frame assembly system
- lithographic system
- lithography system
- logic analysis system
- logic synthesis system
- mask alignment and exposure system
- metal system
- metallization system
- Micralign system
- micro-Optical Electro-Mechanical systems MOEMS
- micro-Optical Electro-Mechanical systems
- micropower system
- multichip system
- multicircuit microprocessor system
- multidomain system
- multiple-tens camera system
- negative-resist system
- non-real-time data automation system
- one-step t-fault diagnosable system
- one-to-one scanning system
- on-line circuit analysis system
- on-line circuit design system
- open-ended CAD system
- open-tube system
- palladium-silver thick-film conductor system
- palladium-silver conductor system
- paste system
- photomasking system
- photorepeating system
- pick-and-place system
- planar plasma system
- plenum flush system
- portable CAD system
- positive resist system
- preinsertion processing system
- printed-circuit board assembly system
- printed-circuit assembly system
- probing system
- processing system
- production system
- projection printing system
- projection system
- quick vacuum system
- reduced system
- reducing electron -beam projection system
- reducing electron projection system
- reflow soldering system
- rinser/dryer system
- screen printing system
- scribing system
- self-documenting CAD system
- self-repair system
- sequentially t-fault diagnosable system
- shaped-beam e-beam system
- single-chip system
- SMIF system
- software test-bed system
- solder evacuation system
- solder fusion system
- split-chamber vacuum coating system
- split-field alignment system
- step-and-repeat system
- step-and-repeat photomask system
- step-on-wafer projection system
- surface measurement system
- terminal point detection system
- thermal mapping system
- thick-film resistor system
- transfer system
- transport system
- tri-metal system
- trimming system
- turnkey CAD system
- UV exposure system
- vacuum-deposition system
- vacuum purge system
- variable-shaped electron-beam exposure system
- vector-scan e-beam system
- wafer gaging system
- wafer routing system
- wafer-scale system
- wafer-stepper projection system
- wave solder system
- wiring system
- X-ray exposure system
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См. также в других словарях:
ion etching — ion etching, a method of eroding materials such as metals, glass, polymers, and body tissue, atom by atom, by bombarding them with high energy ions, in order to reveal their smallest structural features … Useful english dictionary
ion etching — joninis ėsdinimas statusas T sritis radioelektronika atitikmenys: angl. ion etching vok. Ionenätzen, n rus. ионное травление, n pranc. décapage ionique, m … Radioelektronikos terminų žodynas
ion-etching chamber — joninio ėsdinimo kamera statusas T sritis radioelektronika atitikmenys: angl. ion etching chamber vok. Ionenätzkammer, f rus. камера для ионного травления, f pranc. chambre pour décapage ionique, f … Radioelektronikos terminų žodynas
Deep reactive-ion etching — (DRIE) is a highly anisotropic etch process used to create deep penetration, steep sided holes and trenches in wafers, with aspect ratios of 20:1 or more. It was developed for microelectromechanical systems (MEMS), which require these features,… … Wikipedia
Reactive-ion etching — (RIE) is an etching technology used in microfabrication. It uses chemically reactive plasma to remove material deposited on wafers. The plasma is generated under low pressure (vacuum) by an electromagnetic field. High energy ions from the plasma… … Wikipedia
Reactive-ion etching — Gravure ionique réactive La gravure ionique réactive ou gravure par ions réactifs très souvent appelée par son acronyme anglophone, RIE (pour Reactive Ion Etching), est une technique de gravure sèche des semi conducteurs. Il s agit d une… … Wikipédia en Français
Reactive Ion Etching — Gravure ionique réactive La gravure ionique réactive ou gravure par ions réactifs très souvent appelée par son acronyme anglophone, RIE (pour Reactive Ion Etching), est une technique de gravure sèche des semi conducteurs. Il s agit d une… … Wikipédia en Français
Deep Reactive Ion Etching — Reaktives Ionentiefenätzen (engl. Deep Reactive Ion Etching, DRIE), eine Weiterentwicklung des reaktiven Ionenätzen (RIE), ist ein hoch anisotroper Trockenätzprozess für die Herstellung von Mikrostrukuren in Silicium mit Aspektverhältnissen (das… … Deutsch Wikipedia
reactive ion etching — reaktyvusis joninis ėsdinimas statusas T sritis radioelektronika atitikmenys: angl. reactive ion etching; reactive ion milling vok. reaktives Ionenätzen, n rus. реактивное ионное травление, n pranc. décapage ionique réactif, m … Radioelektronikos terminų žodynas
diode ion etching — dvielektrodis joninis ėsdinimas statusas T sritis radioelektronika atitikmenys: angl. diode ion etching vok. Diodenätzen, n; Ionenstrahlätzen in einer Diodenätzanlage, n rus. двухэлектродное ионное травление, n pranc. décapage ionique à l… … Radioelektronikos terminų žodynas
high-frequency ion etching — aukštadažnis joninis ėsdinimas statusas T sritis radioelektronika atitikmenys: angl. high frequency ion etching vok. Hochfrequenzionenätzen, n rus. высокочастотное ионное травление, n pranc. gravure ionique à haute fréquence, f … Radioelektronikos terminų žodynas